| Hscode | Description | MFN rate | Temperate rate | Comsumer rate | Vat rate | US additional | CA additional | Detail |
|---|---|---|---|---|---|---|---|---|
| 8486203110 | Distributed repetitive lithography machine for manufacturing semiconductor devices or integrated circuits (for post-processing) | 0% | - | 0% | 13% | 10% | More | |
| 8486203120 | Distributed Repeat Lithography Machine for Manufacturing Semiconductor Devices or Integrated Circuits (I-line Lithography Machine for Front Processing) | 0% | - | 0% | 13% | 10% | More | |
| 8486203130 | Distributed repetitive lithography machine for manufacturing semiconductor devices or integrated circuits (KrF lithography machine for front-end) | 0% | - | 0% | 13% | 10% | More | |
| 8486203190 | Distributed repetitive lithography machines for manufacturing other semiconductor devices or integrated circuits | 0% | - | 0% | 13% | 10% | More | |
| 8486203910 | I-line lithography machine for manufacturing semiconductor devices or integrated circuits (excluding stepper type) | 0% | - | 0% | 13% | 10% | More | |
| 8486203920 | Krypton fluoride (KrF) lithography machines used for manufacturing semiconductor devices or integrated circuits (excluding stepper) | 0% | - | 0% | 13% | 10% | More | |
| 8486203930 | Argon fluoride (ArF) lithography machines for manufacturing semiconductor devices or integrated circuits (excluding stepper) | 0% | - | 0% | 13% | 10% | More | |
| 8486203940 | ArFi immersion lithography machines for manufacturing semiconductor devices or integrated circuits (excluding stepper lithography) | 0% | - | 0% | 13% | 10% | More | |
| 8486203950 | Extreme Ultraviolet (EUV) lithography machines for manufacturing semiconductor devices or integrated circuits (excluding stepper) | 0% | - | 0% | 13% | 10% | More | |
| 8486203990 | Lithography equipment for manufacturing semiconductor devices or integrated circuits not listed | 0% | - | 0% | 13% | 10% | More |